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Fused Silica glass substrate/plate

Fused Silica glass substrate/plate

Click here for: Quartz(SiO2) single crystal substrate/wafer

  Fused Silica Quartz (SiO2) glass substrate


Fused Silica Quartz (SiO2) glass

Other Names

Fused Quartz substrate, Quartz glass plate, Fused Silica substrate, Fused Silica plate

Grade / Application band

JGS1 (VUV grade), Can be used in 180~2500nm wave band
JGS2 (UV grade), Can be used in 220~2500nm wave band (Commonly used)
JGS3 (IR grade), Can be used in 700~3500 wave band

Refractive index

1.47012 at 4um

Specific heat

703 J/kg. ℃
Thermal conductivity

1.38 W/m. ℃

Thermal expansion coefficient

0.55 x 10E-6 /℃ at 300K

Moh's hardness

5.5 ~ 6.5

Compressive strength

1100 Mpa

Young's modulus

73.1 Gpa

Shear modulus of elasticity

31.2 Gpa

Apparent elastic limit

55 MPa(7980 psi)


Quartz glass is extremely excellent in heat resistance, light transmittance, electrical insulation, and chemical stability. Can be used to make electric light source, semi-conductive device, optical instrument, etc.


Material Standard Size Surface quality
Fused Silica glass substrate φ25.4mm x 0.5mm
φ50.8mm x 0.5mm
φ100mm x 0.5mm
10 x 10 x 1.0mm
10 x 10 x 0.5mm
20 x 20 x 0.5mm
50 x 50 x 0.5mm
100 x 100 x 0.5mm
100 x 100 x 2.0mm

Or others
- Double side optical-polished (Roughness: Ra 5~10nm)
- Double side CMP-polished (Roughness: Ra<0.5nm)
Size Tolerance:          +/-0.1mm
Thickness Tolerance: +/-0.1mm or +/-0.05mm
Others:                 Upon requirements

Parallelism:               3 minutes, 1 minute, 30 seconds, 5 seconds or higher
Surface Finish:         60-40, 40-20, 20-10 (scratch-dig)
Surface Figure:        1/2λ, 1/4λ or higher
Chamfer:                  0.25mm × 45°

Fused Silica glass is excellent and widely used in new lighting sources, also used in the manufacture of modern light sources such as xenon lamps, pulse lamps, atomic spectrum lamps;
Fused Silica Quartz glass substrate is composed of pure SiO2 and is an indispensable high-purity material for the electronics industry. As a crucible for the production of silicon single crystals, diffusion tubes and instrumentation for the manufacture of integrated circuits are made of quartz glass; Fused Silica Quartz glass has a very low spectral loss and is the leading material for the manufacture of optical fibers; Quartz glass plate/substrate has a wide transmission range from ultraviolet to infrared, and is resistant to rapid cooling and rapid heat. It is an irreplaceable optical material for aerospace.

The JGS1 is  VUV grade of Fused Silica and has high transmittance(>90%) in 180~2500nm wave band. The JGS2 is UV grade of Fused Silica has high transmittance(>90%) in 220~2500nm wave band. And the JGS3 is IR grade of Fused Silica has high transmittance(>90%) in 700~3500nm wave band. 

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