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Nitride on Silicon wafer

Standard Specifications
Product Name	Nitride on Silicon wafer (SiNx/Si) Nitride layer on Silicon wafer

Nitride-layer(SiO2 layer)	50nm, 100nm, 150nm, 200nm, 300nm, 500nm, 1um or others
Nitridation surface	Single sided Nitridation, Double sided Nitridation
Nitridation process	LPCVD(low stress), PECVD

Conductivity type/Dopant	N-type/Phos-doped or N-type/As-doped or P-type/Boron-doped or Un-doped
Orientation	<100> or <111>
Diameter of Silicon wafer	2"(50.8mm), 3"(76.2mm), 4"(100mm), 6"(150mm), 8"(200mm), 12"(250mm)
Thickness of Silicon wafer	280um, 380um, 525um, 625um, 675um, 725um
Resistivity (Ohm-cm)	0.001~0.005, 0.01~0.09, 0.1~0.9, 1~10, 1~100, >1000, >10000, >20000
Polishing	Single side polished or Double side polished
Surface Roughness	Ra<5A (0.5nm)

Standard Specifications
Product Name	Orientation	Standard Size	Nitride-layer	Polishing
Nitride on Silicon wafer (Un-doped or P-type or N-type)	<100> ±0.5° <110> ±0.5° <111> ±0.5° Or others	φ2" x 0.28mm φ3" x 0.38mm φ4" x 0.5mm φ6" x 0.625mm φ8" x 0.725mm φ12" x 0.775mm Or others	30nm 50nm 100nm 150nm 200nm 300nm 500nm 1μm Or others	SSP or DSP Nitride-layer on One side or Both side	Send Inquiry

Nitrided silicon wafer is a semiconductor substrate material formed by growing a layer of silicon nitride (Si3N4) film on the surface of a single crystal silicon wafer through LPCVD, PECVD and other processes. The film thickness is usually in the range of 50nm~500nm.

Core Features

- Mechanical properties: Silicon nitride thin films have high mechanical strength, and their compressive strength increases with film thickness. Even as thin as 50nm, structural stability can still be maintained.

- Chemical stability: resistant to conventional acid-base corrosion, only slowly etched in hydrofluoric acid environment, suitable for most micro nano processing scenarios.

Main application

- Semiconductor manufacturing: As a mask layer and passivation layer in wafer processing, it blocks impurity diffusion and protects the circuit structure of silicon wafers. It is a commonly used supporting material for 4/6/8-inch semiconductor silicon wafer processes.

- MEMS sensor: As a sensitive functional membrane of microelectromechanical systems, relying on its stable mechanical properties, it achieves precise sensing of signals such as pressure and vibration.

- Optoelectronic devices: used as precision interface layers in optical devices and biochips, balancing transparency and structural support, and adapting to the integration requirements of micro - and nano scale devices.

We can offer Nitride on Silicon wafer in 2~8 inch size, and with Nitride-layer thickness from 25nm to over 1μm. We can also pre-dice wafer to small size like 10x10mm or 5x5mm or 20x20mm or 25x25mm or others.

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BIOTAIN CRYSTAL CO., LIMITED
Tel: (+86) 1506 0796 451
Fax: (+86) 0597 2212602
Email: sales@crystal-material.com
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Main office: #15, No. 77, XiNiuNan Road, Xipi street, Xinluo District, Longyan, Fujian, China

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Nitride on Silicon wafer

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