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MgO substrate

MgO substrate

 

The main performance parameters
Growth method
Arc melting method
Crystal structure
Cubic
Lattice constant
a = 4.130 Å
Melting point (℃)
2800
Purity
99.95%
Density (g / cm 3)
3.58
Hardness
5.5 (mohs)
Coefficient of thermal expansion (/ ℃)
11.2x10 -6
Crystal cleavage plane
<100>
Optical transmission
> 90% (200 ~ 400nm),> 98% (500 ~ 1000nm)
Permittivity
ε = 9.65
Thermal conductivity (cal / cm sec degree)
0.14 300 ° K
Dimension
10x3, 10x5, 10x10, 15x15,, 20x15, 20x20,
dia2 "x 0.33mm dia2" x 0.43mm 15 x 15 mm
Thickness
0.5mm, 1.0mm
Polishing
Single or double side polished
Crystal orientation
<100>, <110>, <111> ± 0.5 º
Crystal face orientation accuracy:
± 0.5 °
Edge orientation accuracy:
2 ° (Can reach within 1 °)
Other direction of substrate
According to specific needs, we can process it with orientation off angle (1 ° -45 °) 
Roughness (Ra):
≤ 5Å (5μm × 5μm)
Package
100 clean bag, 1000 clean room


Magnesium oxide (MgO) substrate (single crystal) is widely used in  many film  technical fields. As for the production of magnetic film semiconductor film, optical film and the high-temperature superconducting films. It is currently an important industrial temperature superconducting thin films of single-crystal substrates.

Key Features:
MgO single crystal as the dielectric constant and loss microwave band is very small, and can obtain a large area substrate (diameter of 2 inches and larger), it is currently an important industrial HTS thin monocrystalline substrate world.

The main purpose:
For the production of magnetic thin film, a semiconductor film, optical film and the high-temperature superconducting thin film, can also be used for mobile communication equipment for making superconducting devices such as microwave filters.

 
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