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MgO substrate

MgO substrate

 

The main performance parameters

Growth method
Arc melting
Crystal structure
Cubic
Lattice constant
a = 4.216 Å
Melting point (℃)
2800
Purity
99.99%
Density (g / cm 3)
3.58
Mohs Hardness
5.5
Coefficient of thermal expansion (/ ℃)
11.2x10 -6
Cleavage plane
<100>
Optical transmission
> 90% (200 ~ 400nm),> 98% (500 ~ 1000nm)
Permittivity
ε = 9.65
Thermal conductivity (cal / cm sec degree)
0.14 300 ° K
Other direction of substrate
We can customize specific orientation upon requirements
Package
Class-100 clean bag, class-1000 clean room

 

Standard Specification
Product Name Orientation Standard Size Thickness Polishing  
MgO substrate <100> ± 0.5°
<110> ± 0.5°
<111> ± 0.5°

Or other off-angle
10x10mm
10x5mm
5x5mm
25x25mm
15x15mm
φ1" x 0.5mm
φ2" x 0.5mm
Or others
0.1mm
0.2mm
0.5mm
1.0mm
2.0mm
Or others
Fine ground
Single side polished
Double side polished

Roughness: Ra<5A(0.5nm)
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Magnesium oxide (MgO) substrate (single crystal) is widely used in  many film  technical fields. As for the production of magnetic film semiconductor film, optical film and the high-temperature superconducting films. It is currently an important industrial temperature superconducting thin films of single-crystal substrates.

Key Features:
MgO single crystal as the dielectric constant and loss microwave band is very small, and can obtain a large area substrate (diameter of 2 inches and larger), it is currently an important industrial HTS thin monocrystalline substrate world.

The main purpose:
For the production of magnetic thin film, a semiconductor film, optical film and the high-temperature superconducting thin film, can also be used for mobile communication equipment for making superconducting devices such as microwave filters.

 
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